UNIVEX 600
Highlights of the System are the following:
Quality high vacuum coating system, with flexible layout for use in R&D and pilot production.
A stainless steel process chamber, with a large front service door for easy access to the process equipment, substrate stage and other devices inside the chamber.
A high vacuum pumping system with 1,300 l/s magnetically levitated turbo molecular pump.
Branded process equipment such as magnetron and electron-beam evaporator.
Motorized Z-Shift for magnetron (250 mm).
Precise downstream pressure control for sputtering process, with MFC and butterfly valve.
A touchscreen PLC with different user levels, supporting remote access, data logging and active account management.
Including Software Recipe for fully automatic batch run.
Base System
System frame UNIVEX 600
Lacquered mild steel frame for supporting the chamber, the pump system and switch panel. Frame mounted on heavy-duty castors with integrated levelling feet for flexible placement of the system.
Front covering, made of lacquered steel sheets, with tinted slide cover for chamber observation window (anti-glare).
Dimensions (approx.):
Width: 1,600 mm
Depth: 1,250 mm
Height: 2,150 mm
Vacuum chamber UNIVEX 600
Cubic stainless steel chamber, with large front door for easy access to the process equipment. O-Ring sealed stainless steel door with observation window (diameter 100 mm) and exchangeable protection glass. Welded steel channels on the door and side walls for chamber tempering by means of water circulation.
Inner dimensions
Width: 600 mm
Depth: 600 mm
Height: 800 mm
Rear:
1 x DN 250 ISO (for pump system)
2 x DN 40 KF,
2 x DN 25 KF,
2 x DN 16 KF
Top:
1 x DN 250 ISO (substrate stage),
4 x diameter 34.5 mm
Bottom:
8 x diameter 34.5 mm
1 x DN 160 CF (sputter source),
Gauges & chamber accessories
IONIVAC Combined Transmitter ITR 90, with dual filament combining the hot cathode ionization (Bayard-Alpert) and the Pirani principle.
Measuring range: 5 ×·10-10 to 1000 mbar
Accuracy: 15% of reading (b/w 1 ×·10-2 and 1 ×·10-8 mbar)
Connection flange: DN 25 KF
Low pressure safety switch PS 113A,for correctly indicating vented chamber status
Fixed switching pressure: approx. 6 mbar below atm.
Connection flange: DN 16 KF
Pressure Relief Valve,to safely prevent excessive overpressures inside the chamber
Responding Pressure:1150 +/-40 mbar, overpressure
Connection flange:DN 16 KF
Electro-pneumatic right angle valve DN 16 KF, for chamber venting
Pump system
TURBOVAC MAG W 1300 iP; DN 200 ISO-F
Magnetically-levitated turbo molecular pump with integrated converter and power supply. Including water-cooling and connections for purge gas and vent.
Mounting in any orientation.
Pumping Speed:
N2: 1,100 l/s
H2: 1,050 l/s
He: 1,220 l/s
Ultimate pressure: < 10-8 mbar
Max. fore-vacuum pressure N2: 4 mbar
High vacuum flange: DN 200 ISO-F
Fore vacuum flange: DN 40 KF
Purge gas and venting valve 24 V DC, 36 sccm.
Center ring with splinter guard for TURBOVAC.
Electro-pneumatic right angle valve, mounted to the fore vacuum flange.
TRIVAC D 30 T
Two-stage, oil-sealed rotary vane pump, air-cooled with manual gas-ballast valve and hydro-pneumatic anti suck-back valve for securing the vacuum.
Pumping Speed (50 / 60 Hz): 23.9 / 28.7 m³/h
Total end pressure w/o gas-ballast: ≤ 0.005 mbar
Total end pressure with gas-ballast: ≤ 0.008 mbar
Flange connection suction side: DN 25 KF
exhaust side: DN 25 KF
Motor rating: 750 W
Oil filling: Leybonol LVO 100
Exhaust filter AF 16-25 for separating oil mist and aerosols.
Set of fittings and vacuum hose for connecting to the high vacuum pump.
Equipment for sputtering
RF/DC Magnetron sputtering source for 4” targets
Circular magnetron sputter source, Angstrom Sciences ONYX 4, Indirect water-cooled design, for clamping targets with a diameter of 4” and a thickness between 0.060" - 0.375".
Sputter head with vertical alignment (+/- 50 mm), gas line, tilt gimbal, cross-contamination chimney, and electro-pneumatic shutter.
With extended stem tube, completely mounted on a common DN 160 CF flange. Supplied without target.